ITO etching solution "Clean Etch ITO series"
We provide excellent etching for ITO films, with options available for both a-ITO etching and p-ITO etching.
The features of this product are as follows: - There are no residues after etching. - It has low foaming properties and excellent defoaming capabilities. - The etching speed and the in-plane uniformity of the etching shape are good. Keywords: wet etching, indium tin oxide
- Company：Hayashi Pure Chemical Ind., Ltd. Electronic Materials
- Price：Other
